High-Purity, High-Density Targets for Thin-Film Applications
Alumina Ceramic Sputtering Targets
We manufacture high-purity alumina ceramic sputtering targets with unique physical and chemical properties, designed for high-performance thin-film deposition.
Key Features of Our Sputtering Targets
High-Purity & Density
Ensures uniform sputtering and stable, high-quality film performance.
Precision Surface Polishing
Utilizing specialized equipment, we achieve superior surface flatness and polish, critical for sputtering uniformity.
Excellent Electrical Insulation
Provides high insulation and stable chemical properties during the deposition process.
Made-to-Order Capability
While demand is specialized, we demonstrate our capability to produce high-precision targets to your specs.
Ideal Applications
Ideal Applications for Alumina Targets
A critical component in advanced thin-film manufacturing.
Technical Data Sheet
Standard Dimensions & Specifications
As sputtering targets are typically custom-made, please contact us with your specific requirements for purity, dimensions, and surface polish.
Customization
OEM & Made-to-Order Targets
We are equipped to manufacture high-precision alumina targets to your exact technical drawings.
- Precision manufacturing based on your CAD drawings or samples.
- Specific dimensions, tolerances, and surface finish (e.g., Ra < 0.1μm).
- Purity levels from 99.1% to 99.9% available.
